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Photoelectron Spectrometer Product List and Ranking from 9 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

Photoelectron Spectrometer Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

  1. 一般財団法人材料科学技術振興財団　MST Tokyo//Testing, Analysis and Measurement
  2. シエンタ オミクロン Tokyo//Testing, Analysis and Measurement
  3. アズサイエンス 松本本社 Nagano//Trading company/Wholesale
  4. 4 サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K. Tokyo//Testing, Analysis and Measurement
  5. 5 カネカテクノリサーチ 本社、東京営業所、名古屋営業所、大阪分析センター、高砂分析センター Osaka//Testing, Analysis and Measurement
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Photoelectron Spectrometer Product ranking

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

  1. JPS-9030 Photoelectron Spectroscopy Device (XPS) アズサイエンス 松本本社
  2. Fully Automated X-ray Photoelectron Spectroscopy Device 'K-Alpha' サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K.
  3. [UPS] Ultraviolet Photoelectron Spectroscopy 一般財団法人材料科学技術振興財団　MST
  4. 4 HAXPES-Lab (Laboratory-type Hard X-ray Photoelectron Spectroscopy Analysis System) シエンタ オミクロン
  5. 4 ARPES-Lab (Angle-Resolved Photoemission Spectroscopy Analysis System) シエンタ オミクロン

Photoelectron Spectrometer Product List

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Fully Automated X-ray Photoelectron Spectroscopy Device 'K-Alpha'

Fully Automated X-ray Photoelectron Spectroscopy Device 'K-Alpha'

Capable of meeting various needs! Introducing an XPS device that achieves excellent operability and high-sensitivity measurements.

The K-Alpha is a fully automated X-ray photoelectron spectroscopy device that achieves the highest level of operability and unparalleled performance simultaneously through the adoption of new technology. Equipped with a low-power, high-intensity X-ray monochromator, it allows for the selection of analysis areas in 5μm steps from 50μm to 400μm. By adjusting the analysis area to the desired sample size, it is possible to obtain the highest level of signal intensity. 【Features】 ■ High sensitivity, high energy resolution XPS measurements ■ Micro-focus X-ray source for micro-area analysis ■ Real-time sample observation mechanism from the vertical direction of the sample ■ Excellent operability and high throughput ■ Integrated control of measurement, analysis, and device control through the Thermo Scientific Avantage data system *For more details, please refer to the PDF document or feel free to contact us.

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  • Spectroscopic Analysis Equipment

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X-ray photoelectron spectroscopy device 'Nexsa'

X-ray photoelectron spectroscopy device 'Nexsa'

Achieving micro-scale and multifunctional analysis! X-ray photoelectron spectroscopy device capable of equipping multifunctional options.

"Nexsa" is an X-ray photoelectron spectroscopy device that achieves both the highest level of performance and complete automation of measurements. The new monochromator X-ray source can measure from 10 to 400 μm in 5 μm steps while maintaining high sensitivity. The combination of a high-efficiency lens system and detector enables high-sensitivity, high-speed XPS analysis. 【Features】 ■ Capable of measuring low-concentration compounds and microscopic areas ■ Achieves both the highest level of performance and complete automation of measurements ■ Multi-functional options can be equipped ■ Realizes high-sensitivity, high-speed XPS analysis ■ Makes it easy to measure insulators *For more details, please refer to the PDF document or feel free to contact us.

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  • Spectroscopic Analysis Equipment

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Environmental Control X-ray Photoelectron Spectroscopy Device EnviroESCA

Environmental Control X-ray Photoelectron Spectroscopy Device EnviroESCA

Operando measurements can be performed in the laboratory under a maximum pressure of 0.1 atmospheres.

EnviroESCA measures samples in a near-atmospheric pressure environment (up to 0.1 atm), eliminating the need for the ultra-high vacuum environments traditionally required. It can start measurements just a few minutes after introducing liquid, aqueous, volatile, or highly degassing porous samples into the EnviroESCA sample chamber. Not only can it analyze samples that conventional XPS would have given up on, but it also serves as a powerful tool for pioneering new research fields by freely controlling ambient gases and temperatures. It easily enables measurements under device operating conditions, known as "operando measurements," which are rapidly gaining attention. With EnviroESCA, which does not require ultra-high vacuum conditions, quality inspections on production lines that require a large number of inspections in a short time can be efficiently conducted. It is also possible to use robots and auto-loaders to batch process samples from introduction to measurement without human intervention. EnviroESCA, which dispels the conventional notion of X-ray photoelectron spectroscopy being limited to ultra-high vacuum environments, drives novel research and development and provides entirely new applications for X-ray photoelectron spectroscopy in fields such as medicine, biology, and life sciences.

  • Spectroscopic Analysis Equipment

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[XPS] X-ray Photoelectron Spectroscopy

[XPS] X-ray Photoelectron Spectroscopy

Effective for evaluating the types, quantities, and chemical bonding states of elements on the sample surface (at a depth of about several nanometers).

XPS is a technique that measures the kinetic energy distribution of photoelectrons emitted by X-ray irradiation, providing insights into the types, quantities, and chemical bonding states of elements present on the sample surface (to a depth of about a few nanometers). Because it can provide information about chemical bonding states, it is also known as ESCA: Electron Spectroscopy for Chemical Analysis. - Qualitative and quantitative analysis of elements on solid surfaces (approximately 2 to 8 nm) is possible. - Chemical bonding state analysis is possible. - Non-destructive analysis is possible. - Measurement of depth distribution (using ion sputtering) is possible. - Measurement of insulators is possible. - Measurement under controlled atmospheres is possible.

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  • Contract Analysis
  • Contract measurement
  • Contract Inspection

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[UPS] Ultraviolet Photoelectron Spectroscopy

[UPS] Ultraviolet Photoelectron Spectroscopy

For qualitative and quantitative analysis of the composition of the sample surface and work function evaluation.

UPS is a method that measures the kinetic energy distribution of electrons emitted by ultraviolet light irradiation, providing insights into the valence states of the sample's surface (on the order of a few nanometers). On the other hand, it is also used to evaluate the work function of various metal materials by utilizing high energy resolution. Since it can be measured alongside XPS analysis, it is possible to investigate the qualitative and quantitative surface composition of the sample and the correlation between bonding states and work function values.

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  • Contract Analysis
  • Contract measurement
  • Contract Inspection

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[Analysis Case] Evaluation of Composition and Bonding State of GaN Film by XPS

[Analysis Case] Evaluation of Composition and Bonding State of GaN Film by XPS

Evaluation will be conducted under measurement conditions tailored to the purpose.

This text introduces an example of evaluating the composition and bonding states of GaN films used in LEDs and power devices using XPS. Understanding how the composition and bonding states change due to film formation conditions and surface treatments is effective for process management. It is important to appropriately select the X-rays used during the evaluation according to the purpose. Measurement conditions for each focus will also be presented.

  • Contract Analysis

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[Analysis Case] Evaluation of Binding States in Secondary Battery Cathodes

[Analysis Case] Evaluation of Binding States in Secondary Battery Cathodes

You can evaluate the sample in its original state, from the binder and coating to the active substance.

Our organization conducts evaluations of the bonding state of cathodes in secondary batteries. X-ray photoelectron spectroscopy (XPS), which is one of the methods for analyzing surface states, is suitable for evaluating binders and conductive additives due to its shallow detection depth (approximately 10 nm). Hard X-ray photoelectron spectroscopy (HAXPES), which uses hard X-rays (Ga rays) for excitation, allows us to obtain information about active materials buried under binders without causing damage, thanks to its deeper detection depth. 【Measurement and Processing Methods】 ■ [XPS] X-ray Photoelectron Spectroscopy ■ [HAXPES] Hard X-ray Photoelectron Spectroscopy ■ Processing under controlled atmosphere *For more details, please download the PDF or feel free to contact us.

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  • Contract Analysis

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HAXPES-Lab (Laboratory-type Hard X-ray Photoelectron Spectroscopy Analysis System)

HAXPES-Lab (Laboratory-type Hard X-ray Photoelectron Spectroscopy Analysis System)

Hard X-ray photoelectron spectroscopy, which was only possible at synchrotron facilities, is now available for use in laboratories!

This is a next-generation XPS device that can analyze depths that conventional XPS has not been able to reach until now. It has become possible to use hard X-rays, which were previously only available at synchrotron facilities. High-resolution hard X-ray photoelectron spectroscopy has been achieved using a Ga Kα monochromatic X-ray source with 9.25 keV excitation. 【Applications】 XPS observation and measurement of samples in areas deeper than the surface. --- Below is an introduction in English. HAXPES-Lab is designed to allow hard X-ray photoelectron spectroscopy (HAXPES) measurements in standard lab environments. The instrument offers the unique possibility to investigate bulk properties of various materials, analyze buried interfaces, and access deep core levels. *For more details, please contact us.

  • Analytical Equipment and Devices

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ARPES-Lab (Angle-Resolved Photoemission Spectroscopy Analysis System)

ARPES-Lab (Angle-Resolved Photoemission Spectroscopy Analysis System)

Introduction of a next-generation ARPES measurement device for XPS observation and measurement with angle-resolved ARPES!

The ARPES-Lab (ARPES photoelectron spectroscopy analysis system) is a device used for XPS observation and measurement. 【Purpose】 XPS observation and measurement using ARPES --- Below is an introduction in English. The ARPES-Lab brings together the world leading instrumentation for ARPES: ●Outstanding performance ARPES system with unchallenged energy and angular resolution ●Intelligent integration and automation ●Revolutionary DA30 deflection mode operation: - Improved ky accuracy - Matrix element effects are avoided by keeping the sample fixed - Ensures the same sample point for all k// *For more details, please contact us or download the PDF materials.

  • Analytical Equipment and Devices

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HAXPES Lab system

HAXPES Lab system

A window to the bulk" , "Beam time at your fingertips

This is a lab-type photoelectron spectroscopy system that uses hard X-rays as the excitation source. Hard X-ray Photoelectron Spectroscopy (HAXPES) is one of the next-generation photoelectron spectroscopy (XPS) techniques that many synchrotron facilities have already adopted. It is gaining attention as a method that can provide information about the substrate of films, buried interfaces, and deep inner shell orbitals that are not accessible with conventional XPS. By placing this system in your lab, you can enable next-generation photoelectron spectroscopy measurements that provide not only surface information but also bulk information, a technique that was previously only measurable at synchrotron facilities.

  • Analytical Equipment and Devices

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[Analysis Case] Analysis of Surface Functional Groups of Polymer Materials (Chemical Modification - XPS)

[Analysis Case] Analysis of Surface Functional Groups of Polymer Materials (Chemical Modification - XPS)

This paper presents a case where a specific functional group was chemically modified using a reagent containing heteroatoms, and the ratio of surface functional groups derived from the introduced heteroatoms was evaluated.

【Analysis Sample】4,4'-Diaminodiphenyl Ether (DADPE), OH-terminated Si wafer 【Analysis Method】XPS; monochromatic AlKα radiation (ULVAC-PHI model PHI5000 VersaProbe II) 【Analysis Results】 1. Evaluation of Amino Groups Focusing on the heteroatom F, the analysis revealed that the proportion of amino groups relative to the carbon from the sample was 19 at%. 2. Evaluation of Silanol Groups Focusing on the heteroatom F, the analysis revealed that the proportion of silanol groups relative to the silicon from the sample was 3 at%. 【Summary】 XPS analysis of chemically modified samples allows for the determination of the proportion of surface functional groups. Additionally, by analyzing the surfaces of samples with different material properties and comparing the proportions of surface functional groups, it is also possible to evaluate the impact of surface functional groups on material properties.

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Atmospheric Photoelectron Spectrometer "AC-5"

Atmospheric Photoelectron Spectrometer "AC-5"

Adoption of a new type of detector! It can automatically measure up to 25 sheet-like or powder-like samples.

The AC-5 is a photoelectron spectrometer that can count up to 4000 photoelectrons per second with the adoption of new sensors. It can accommodate large samples up to 180mm x 180mm and allows for measurements at any specified spot. Additionally, with the optional sample changer, it can automatically measure up to 25 plate-like or powder samples, and by using a Xe (xenon) lamp, it enables high-sensitivity measurements of substances that are difficult to emit electrons, such as toner. 【Features】 ■ Work function and ionization potential can be measured in about 5 minutes in the atmosphere ■ Capable of measuring large samples (MAX 180mm x 180mm) ■ Continuous measurement is possible (up to 25 samples at a time) ■ Adoption of a new type of detector (the measurement of the number of electrons per second is doubled compared to our previous models) ■ Capable of measuring powders and liquids *For more details, please refer to the PDF document or feel free to contact us.

  • Analytical Equipment and Devices
  • Spectroscopic Analysis Equipment

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JPS-9030 Photoelectron Spectroscopy Device (XPS)

JPS-9030 Photoelectron Spectroscopy Device (XPS)

Something that everyone can easily use right away.

Japan Electronics Co., Ltd. JPS-9030 Photoelectron Spectroscopy System (XPS) adopts a newly designed user interface that can be operated in a Japanese environment, achieving "anyone can easily and immediately use it." In addition, it comes standard with a Kaufman-type etching ion source and twin anodes, and while being a general-purpose XPS, it also has a wide range of expandability, including a high-temperature heating system and gas cluster ion source. 〇 Features - Depth profiling (depth direction analysis) that accommodates a wide range of purposes from nm to μm - Newly developed software focused on ease of use - Ultra-high sensitivity comparable to high-end models - Abundant options *For more details, please download the PDF or feel free to contact us.

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Application examples of total reflection HAXPES

Application examples of total reflection HAXPES

Under the condition of total reflection, the penetration depth of X-rays is shorter than the escape depth of photoelectrons, so the detection depth of HAXPES is determined by the penetration depth of the X-rays!

Hard X-ray photoelectron spectroscopy (HAXPES) has made significant progress by enabling bulk-sensitive measurements in the hard X-ray region, whereas measurements in the soft X-ray region had been mainstream until now. On the other hand, HAXPES measurements under total reflection conditions of X-rays are also being conducted for the purpose of analyzing surface states. Under total reflection conditions, X-rays are incident at the critical angle for total reflection, which limits the depth of penetration into the material. Applying this characteristic to HAXPES allows for the analysis of bonding states of interfacial oxide layers and segregated impurities at the atomic layer level. *For more detailed information, please refer to the attached PDF document. Feel free to contact us for further inquiries.

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Evaluation of surface oxide film thickness using photoelectron spectroscopy.

Evaluation of surface oxide film thickness using photoelectron spectroscopy.

Calculate the oxide film thickness of the SiO2 surface oxide film on the Si substrate using photoelectron spectroscopy!

In the process of forming an oxide film, controlling the thickness of the oxide film is one of the very important factors. Therefore, we estimated the thickness of the surface oxide film non-destructively using photoelectron spectroscopy. In samples covered with a thin oxide film, many elemental photoelectron peaks show a two-peak structure corresponding to the oxide component and the substrate component. By measuring the spectral intensity of each component, we can estimate the thickness of the oxide film. There are several analytical methods to determine film thickness non-destructively, but compared to other methods, the ability to estimate the thickness at specific locations is a characteristic of this method. *For more detailed information, please refer to the attached PDF document. For further inquiries, feel free to contact us.*

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